R. Jacquier; R. Agnello; B. Pouradier Duteil; P. Guittienne; A. Howling et al. : First B-dot measurements in the RAID device, an alternative negative ion source for DEMO neutral beams. 2019. DOI : 10.1016/j.fusengdes.2019.02.025.
I. Furno; R. Agnello; U. Fantz; A. Howling; R. Jacquier et al. : Helicon wave-generated plasmas for negative ion beams for fusion. 2017. 22 Topical Conference on Radio-Frequency Power in Plasmas, Aix en Provence, 30 May - 2 June 2017. p. 03014. DOI : 10.1051/epjconf/201715703014.
C. Marini; B. Duval; I. Furno; A. Howling; R. Jacquier et al. : Spectroscopic measurements of hydrogen dissociation degree and H− production in resonant antenna-generated helicon plasmas. 2016. 43rd EPS Conference on Plasma Physics, Leuven, Belgium, July 4-8, 2016. p. P4.110.
A. Howling; P. Guittienne; R. Jacquier; I. Furno : RF inductive probe to measure plasma complex conductivity ; 69th Annual Gaseous Electronics Conference, Bochum, Germany, October 10-14, 2016.
I. Furno; R. Agnello; B. Duval; C. Marini; A. Howling et al. : A novel helicon plasma source for negative ion beams for fusion ; 5th International Symposium on Negative Ions, Beams and Sources - NIBS, Oxford, UK, 12th - 16th September 2016,.
A. Howling; P. Guittienne; I. Furno : RF antennas as plasma monitors ; Frontiers of Low Temperature Plasma Diagnostics, Porquerolles, France, May 24-28, 2015.
A. A. Howling; P. Guittienne; C. Hollenstein; I. Furno : Resonant rf network antennas for inductively-coupled plasma sources. 2014. 41st European Physical Society Conference on Plasma Physics, Berlin, 23-27 June 2014. p. P2.139.
B. Legradic; A. Howling; C. Hollenstein : RF breakdown in low pressure gases in small (millimetric) gaps with non-planar surfaces. 2010. 37th IEEE International Conference on Plasma Science (ICOPS), Norfolk, VA, USA, June 20-24, 2010.
B. Legradic; A. Howling; C. Hollenstein : Effect of surface structures on RF breakdown ; High Frequency Gas Breakdown Workshop, in 7th International Conference on Reactive Plasmas (ICRP) and 63rd Gaseous Electronics Conference (GEC), Paris, France, October 4-8, 2010.
B. Legradic; A. Howling; C. Hollenstein : RF breakdown in low pressure gases between small (millimetric) gap parallel plate electrodes with surface structures. 2010. 7th ICRP and 63rd GEC, Paris, France, October 4-8, 2010. p. TF1-003.
A. Howling : Review of Large Area Plasma Processing at CRPP from 1990-2010 ; Invitation to Nankai University, Tianjin, China, March 28 - April 3, 2010.
A. Howling : Diagnostics and Simulation for Large Area RF Plasma Deposition Reactors ; Invitation to Nankai University, Tianjin, China, March 28 - April 3, 2010.
A. A. Howling; B. Strahm; C. Hollenstein : Non-intrusive plasma diagnostics for the deposition of large area thin film silicon. 2009. 6th Symposium on Thin Films for Large Area Electronics held at the E-MRS Spring Meeting, Strasbourg, France, May 26-30, 1008. p. 6218-6224. DOI : 10.1016/j.tsf.2009.02.053.
A. Howling : Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition (Invited paper) ; American Vacuum Society AVS 56th International Symposium and Exhibition, San Jose, California, USA, November 8-13, 2009.
A. Howling : Reactor design for large area thin film silicon deposition (Invited tutorial) ; 23rd International Conference on Amorphous and Nanocrystalline Semiconductors, Utrecht, The Netherlands, August 23-28, 2009.
A. Howling : Plasma modelling and reactor design (Invited) ; 2nd International Workshop on Thin Film Silicon Solar Cells IWTFSSC-2, Berlin, Germany, April 21-23, 2009.
B. Strahm; A. Feltrin; G. Bugnon; F. Meillaud-Sculati; C. Ballif et al. : Study of the microstructure transition width from amorphous to microcrystalline silicon as a function of the input silane concentration. 2009. SPIE conference on Thin Film Solar Technology, San Diego.
A. Nathan; J. Yang; S. Miyazaki; J. Hou; A. Flewitt et al. : Crystallinity Uniformity of Microcrystalline Silicon Thin Films Deposited in Large Area Radio Frequency Capacitively-coupled Reactors. 2008. Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology held at the 2008 MRS Spring Meeting, San Francisco, CA, March 25-28, 2008. p. 3-14.
C. Hollenstein; A. Howling : Plasma edge simulations by finite elements using Comsol. 2008. COMSOL conference, Hannover, November 4-6, 2008.
B. Strahm; A. Howling; C. Hollenstein : Crystallinity uniformity of microcrystalline silicon thin films deposited in large area RF capacitively-coupled reactors. 2008. Material Research Society, Symposium A, San Francisco, 2008 Spring meeting.
B. Strahm; A. A. Howling; C. Hollenstein : Plasma diagnostics as a tool for process optimization: the case of microcrystalline silicon deposition. 2007. 34th European-Physical-Society Conference on Plasma Physics, Warsaw, POLAND, Jul 02-06, 2007. p. B411-B418. DOI : 10.1088/0741-3335/49/12B/S38.
B. Strahm; A. Howling; C. Hollenstein : Plasma diagnostics as a tool for process optimization:. 2007. 34th EPS Conference on Plasma Physics, Warsaw Congress Centre, Poland, 02 July 2007.
B. Strahm; A. Howling; L. Sansonnens; C. Hollenstein : Optimization of microcrystaline silicon deposition efficiency. 2007. AVS 53rd International Symposium Exhibition, San Francisco, 12 November 2006.
L. Feitknecht; F. Freitas; C. Bucher; B. Strahm; A. Howling et al. : Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors. 2006. EPSEC Conference.
A. A. Howling; L. Sansonnens; C. Hollenstein : Electromagnetic sources of nonuniformity in large area capacitive reactors. 2005. 27th Dry Process Symposium, DPS2005, Jeju, Korea, 28-30 November 2005. p. 5059-5064.
L. Sansonnens; H. Schmidt; A. Howling; C. Hollenstein; C. Ellert et al. : Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonuniformity. 2005. AVS 52st Int. Symposium & Exhibition.
A. Howling; L. Sansonnens; J. Schmitt; J. Ballutaud; H. Schmidt et al. : Elimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition. 2004. Société Suisse de Physique.
L. Sansonnens; J. Schmitt; A. Howling; J. Ballutaud; H. Schmidt et al. : Challenges in RF plasma disposition on square-meter substrates. 2003.
J. Ballutaud; C. Hollenstein; A. Howling; L. Sansonnens; H. Schmidt et al. : Consequences of non-uniform RF plasma potential in large-area capacitive reactors. 2003. 16th International Symposium on Plasma Chemistry.
J. Ballutaud; A. Howling; L. Sansonnens; C. Hollenstein; U. Kroll et al. : Plasma Deposition of p-i-n Devices using a Single PECVD Chamber: Study of the Boron Contamination. 2002. 29th EPS Conference on Controlled Fusion and Plasma Physics.
J. Schmitt; A. Belinger; C. Hollenstein; A. Howling; J. Perrin et al. : Mechanism of substrate charging after plasma processing. 2001. 15th International Symposium on Plasma Chemistry.
A. Howling; L. Sansonnens; C. Hollenstein; A. Belinger; J. Perrin : Measurement of substrate charging after plasma processing. 2001. Frontiers in Low Temperature Plasma Diagnostics IV.
A. A. Howling; L. Sansonnens; J. Ballutaud; F. Grangeon; T. Delachaux et al. : The Influence of Plasma Chemistry on the Deposition of Microcrystalline Silicon for Large Area Photovoltaic Solar Cells. 2000. p. 518-521.
L. Sansonnens; A. Howling; J. Ballutaud; C. Hollenstein : RF plasma deposition uniformity on square-meter substrates. 2000. 27th EPS Conference on Controlled Fusion and Plasma Physics.