Publications

2018

P. Demolon; P. Guittienne; A. Howling; S. Jost; R. Jacquier et al. : RF bias to suppress post-oxidation of mu c-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna; Vacuum. 2018. DOI : 10.1016/j.vacuum.2017.10.020.
P. Demolon; P. Guittienne; A. A. Howling; S. Jost; R. Jacquier et al. : RF bias to suppress post-oxidation of mu c-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna; Vacuum. 2018. DOI : 10.1016/j.vacuum.2017.10.020.

2017

P. Guittienne; R. Jacquier; A. A. Howling; I. Furno : Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry: II. Measurements on a resonant network (vol 24, 065015, 2015); Plasma Sources Science & Technology. 2017. DOI : 10.1088/1361-6595/aa9645.
D. S. Thompson; R. Agnello; I. Furno; A. Howling; R. Jacquier et al. : Ion heating and flows in a high power helicon source; Physics Of Plasmas. 2017. DOI : 10.1063/1.4985328.
P. Guittienne; R. Jacquier; A. Howling; I. Furno : Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source; Plasma Sources Science and Technology. 2017.
C. Marini; R. Agnello; B. P. Duval; I. Furno; A. A. Howling et al. : Spectroscopic characterisation of H2 and D2 helicon plasmas generated by a resonant antenna for neutral beam applications in fusion; Nuclear Fusion. 2017. DOI : 10.1088/1741-4326/aa53eb.

2016

A. Simonin; R. Agnello; S. Bechu; J. M. Bernard; C. Blondel et al. : Negative ion source development for a photoneutralization based neutral beam system for future fusion reactors; New Journal Of Physics. 2016. DOI : 10.1088/1367-2630/18/12/125005.

2015

A. Simonin; J. Achard; K. Achkasov; S. Bechu; C. Baudouin et al. : R&D around a photoneutralizer-based NBI system (Siphore) in view of a DEMO Tokamak steady state fusion reactor; Nuclear Fusion. 2015. DOI : 10.1088/0029-5515/55/12/123020.
A. A. Howling; P. Guittienne; R. Jacquier; I. Furno : Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry. Part I: basic concepts; Plasma Sources Science & Technology. 2015. DOI : 10.1088/0963-0252/24/6/065014.
P. Guittienne; R. Jacquier; A. A. Howling; I. Furno : Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry. Part II: measurements on a resonant network; Plasma Sources Science & Technology. 2015. DOI : 10.1088/0963-0252/24/6/065015.
C. Hollenstein; A. A. Howling; P. Guittienne; I. Furno : Industrial plasmas in academia; Plasma Physics And Controlled Fusion. 2015. DOI : 10.1088/0741-3335/57/1/014010.

2014

P. Guittienne; A. A. Howling; C. Hollenstein : Analysis of resonant planar dissipative network antennas for rf inductively coupled plasma sources; Plasma Sources Science & Technology. 2014. DOI : 10.1088/0963-0252/23/1/015006.

2013

P. Guittienne; A. A. Howling; C. Hollenstein : Generation of Whistler-Wave Heated Discharges with Planar Resonant rf Networks; Physical Review Letters. 2013. DOI : 10.1103/PhysRevLett.111.125005.
C. Hollenstein; P. Guittienne; A. A. Howling : Resonant RF network antennas for large-area and large-volume inductively coupled plasma sources; Plasma Sources Science & Technology. 2013. DOI : 10.1088/0963-0252/22/5/055021.
M. Chesaux; A. A. Howling; C. Hollenstein : Funnelling of rf current via a plasmoid through a grid hole in an rf capacitive plasma reactor; Plasma Sources Science & Technology. 2013. DOI : 10.1088/0963-0252/22/5/055006.
R. Schnyder; A. A. Howling; D. Bommottet; C. Hollenstein : Direct current breakdown in gases for complex geometries from high vacuum to atmospheric pressure; Journal Of Physics D-Applied Physics. 2013. DOI : 10.1088/0022-3727/46/28/285205.
M. Chesaux; A. A. Howling; C. Hollenstein; D. Domine; U. Kroll : Low ion energy RF reactor using an array of plasmas through a grounded grid; Journal Of Vacuum Science & Technology A. 2013. DOI : 10.1116/1.4790423.

2012

S. Lecoultre; P. Guittienne; A. A. Howling; P. Fayet; C. Hollenstein : Plasma generation by inductive coupling with a planar resonant RF network antenna (vol 45, 082001, 2012); Journal Of Physics D-Applied Physics. 2012. DOI : 10.1088/0022-3727/45/40/409502.
P. Guittienne; S. Lecoultre; P. Fayet; J. Larrieu; A. A. Howling et al. : Resonant planar antenna as an inductive plasma source; Journal Of Applied Physics. 2012. DOI : 10.1063/1.4705978.
S. Lecoultre; P. Guittienne; A. A. Howling; P. Fayet; C. Hollenstein : Plasma generation by inductive coupling with a planar resonant RF network antenna; Journal Of Physics D-Applied Physics. 2012. DOI : 10.1088/0022-3727/45/8/082001.
A. A. Howling; B. Legradic; M. Chesaux; C. Hollenstein : Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution; Plasma Sources Science & Technology. 2012. DOI : 10.1088/0963-0252/21/1/015005.

2010

A. Feltrin; B. Strahm; G. Bugnon; F. Sculati-Meillaud; C. Ballif et al. : Input silane concentration effect on the a-Si:H to μc-Si:Hμc-Si:H transition width; Solar Energy Materials and Solar Cells. 2010. DOI : 10.1016/j.solmat.2009.10.021.
B. Legradic; A. A. Howling; C. Hollenstein : Radio frequency breakdown between structured parallel plate electrodes with a millimetric gap in low pressure gases; Physics of Plasmas. 2010. DOI : 10.1063/1.3490190.
A. A. Howling; R. Sobbia; C. Hollenstein : Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition; Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 2010. DOI : 10.1116/1.3328824.

2009

A. Feltrin; B. Strahm; G. Bugnon; F. Sculati-Meillaud; C. Ballif et al. : Input silane concentration effect on the a-Si:H to uc-Si:H transition width; Solar Energy Mater. Solar Cells. 2009. DOI : 10.1016/j.solmat.2009.10.021.

2008

B. Strahm; C. Hollenstein; A. Howling : Uniformity of silicon microcrystallinity in large area RF capacitive reactors; Progress in Photovoltaics. 2008. DOI : 10.1002/pip.857.

2007

B. Strahm; A. A. Howling; L. Sansonnens; C. Hollenstein; U. Kroll et al. : Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization; Solar Energy Materials and Solar Cells. 2007. DOI : 10.1016/j.solmat.2006.10.024.
A. A. Howling; L. Sansonnens; C. Hollenstein : Electromagnetic sources of nonuniformity in large area capacitive reactors; Thin Solid Films. 2007. DOI : 10.1016/j.tsf.2006.10.093.
B. Strahm; A. A. Howling; L. Sansonnens; C. Hollenstein : Optimization of the microcrystalline silicon deposition efficiency; Journal of Vacuum Science & Technology A. 2007. DOI : 10.1116/1.2433985.
B. Strahm; A. A. Howling; L. Sansonnens; C. Hollenstein : Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges; Plasma Sources Science & Technology. 2007. DOI : 10.1088/0963-0252/16/1/011.

2006

L. Sansonnens; A. A. Howling; C. Hollenstein : Electromagnetic field nonuniformities in large area, high-frequency capacitive plasma reactors, including electrode asymmetry effects; Plasma Sources Science & Technology. 2006. DOI : 10.1088/0963-0252/15/3/002.
L. Sansonnens; H. Schmidt; A. A. Howling; C. Hollenstein; C. Ellert et al. : Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity; Journal of Vacuum Science & Technology A. 2006. DOI : 10.1116/1.2189266.

2005

A. A. Howling; L. Derendinger; L. Sansonnens; H. Schmidt; C. Hollenstein et al. : Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: The telegraph effect; Journal of Applied Physics. 2005. DOI : 10.1063/1.1940136.
A. A. Howling; L. Sansonnens; H. Schmidt; C. Hollenstein : Comment on "Ion energy uniformity in high-frequency capacitive discharges" [Appl. Phys. Lett. 86, 021501 (2005)]; Applied Physics Letters. 2005. DOI : 10.1063/1.2012528.
L. Sansonnens; B. Strahm; L. Derendinger; A. A. Howling; C. Hollenstein et al. : Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors; Journal of Vacuum Science & Technology A. 2005. DOI : 10.1116/1.1868572.

2004

U. Kroll; C. Bucher; S. Benagli; I. Schönbächler; J. Meier et al. : High Efficiency p-i-n a-Si:H Solar Cells with Low Boron Cross-Contamination Prepared in a Large Area Single-Chamber PECVD Reactor; Thin Solid Films. 2004. DOI : 10.1016/j.tsf.2003.11.036.
J. Ballutaud; C. Bucher; C. Hollenstein; A. A. Howling; U. Kroll et al. : Reduction of the boron cross-contamination for plasma deposition of p–i–n devices in a single-chamber large area radio-frequency reactor; Thin Solid Films. 2004. DOI : 10.1016/j.tsf.2004.05.034.
A. A. Howling; L. Sansonnens; J. Ballutaud; C. Hollenstein; J. P. M. Schmitt : Nonuniform radio-frequency plasma potential due to edge asymmetry in large-area radio-frequency reactors; Journal of Applied Physics. 2004. DOI : 10.1063/1.1803608.
H. Schmidt; L. Sansonnens; A. A. Howling; C. Hollenstein; M. Elyaakoubi et al. : Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor; Journal of Applied Physics. 2004. DOI : 10.1063/1.1690096.

2002

A. Gallagher; A. A. Howling; C. Hollenstein : Anion reactions in silane plasma; Journal of Applied Physics. 2002. DOI : 10.1063/1.1459758.

2001

A. Belinger; P. Bulkin; L. Delaunay; M. Elyaakoubi; J. Perrin et al. : Electrostatic charging: Mechanism of substrate charging after plasma processing; Panels (Business & Technical news from Unaxis Displays) . 2001.
D. Franz; F. Grangeon; T. Delachaux; A. A. Howling; C. Hollenstein et al. : Rapid deposition of hydrogenated microcrystalline silicon by a high current DC discharge; Thin Solid Films. 2001. DOI : 10.1016/S0040-6090(00)01600-X.

2000

H. Muller; A. A. Howling; C. Hollenstein : Power laws for the spatial dependence of electrical parameters in the high-voltage capacitive RF sheath; Ieee Transactions on Plasma Science. 2000. DOI : 10.1109/27.901258.
J. Perrin; J. Schmitt; C. Hollenstein; A. Howling; L. Sansonnens : The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells; Plasma Physics and Controlled Fusion. 2000. DOI : 10.1088/0741-3335/42/12B/326.
L. Sansonnens; A. A. Howling; C. Hollenstein : A gas flow uniformity study in large-area showerhead reactors for RF plasma deposition; Plasma Sources Science & Technology. 2000. DOI : 10.1088/0963-0252/9/2/314.